San Jose / California / United States
Founded in 1992, n&k Technology manufactures advanced metrology tools for the semiconductor, photomask, flat panel display and data storage industries. The companys high-resolution optical metrology equipment is used for film thickness, n and k, phase shift, trench depth and CD and profile measurements. The core technology is based on DUV-Vis-NIR broadband spectrophotometry with patented reflective optics, in conjunction with the Forouhi-Bloomer dispersion equations and rigorous coupled wave analysis. n&k Technology s equipment, ranging from table-top to fully automated, is field-proven, production-worthy, fast, accurate, non-destructive and will enable users to characterize virtually any combination of thin films, substrates, and structures. n&k Technology s patented reflective optics use no beam splitters, refractive lenses or analyzers. The company s microspot measurement technology covers the entire wave length form 190 to 1,000 nm in one nm intervals. It also features an extra large depth of focus and extra large working distance for easy integration.
